Nanostructures of gold electrodeposited on silicon (100) substrate with two electrode
homemade cell were investigated. In this paper we report our experimental results of goldelectroplating using a sulfite-based electrolyte instead of toxic gold-cyanide. The used electrolyte
was safe and friendly environmental. Film thickness as a function of current density and deposition
rate were calculated using gravity method. An empirical formula was satisfied the expected
deposition thicknesses. Deposition rate of ≈ 5-40nm/ min was achieved. Au (111) structure for gold
nanofilm was characterized by XRD. Morphology of gold film deposited was investigated with
AFM. Morphology of Au thin films on silicon shows nanosize particles after annealing process at
600°C.
Keywords: Gold electroplating, Gold islands, Gold nanostructure, Au film Annealing.
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